Characteristics

Microwaves are extremely well suited to the generation of dense, high-performance plasmas for purification, activation, modification and coating processes. Adjusted particle energy enables the treatment of sensitive polymer or biological substrates and targeted surface functionalisation with sensitive organic modules. The high plasma density also enables extreme processes, such as dry etching or rapid coating (rates of several micrometers per minute) to be carried out. Intensive application at atmospheric pressure is also possible, as is the treatment of substrates at low pressure over a larger area or three-dimensional space.

Our service

Process development

• Consultancy, research and feasibility studies concerning the application of plasmas in customer-specific production and processing steps

• Plasma modification of surfaces

• Deposition of coating structures to form permeation barriers, adhesives or anti-adhesives; deposition of scratch and wear resistant coatings

• Plasma etching and cleaning of surfaces

• Development of plasma processes for powder-like, fibrous and planar structures

Source development

• Upscaling to application size (to a dimension of meters)

• Rapid plasma processes

• Development and characterisation of plasma sources for specific applications

• Development of plasma-UV sources

• Simulation

Facilities and equipment

• Linear plasma source, UV source, 1m, 2kW MW output

• Planar plasma source up to 0.5 x 1 m², 16 kW MW output

• Microwave concentrator plasma source, up to 100 kW MW pulse output

• Atmospheric plasma burner 3 kW MW output